The Paper's Abstract of The 3rd
International Conference on Imaging Science and Hardcopy
　

　

Fabrication of Thin Film of Organopolysilane and 
Its Application to Electron Beam Lithography 

 　
　 　

May 26-29,1998
Chongqing China

Shoji Furukawa
Kyushu Institute of Technology 680-4 Kawazu, Iizuka, Fukuoka 820, Japan
Tel: (+81)948-29-7673, Fax: (+81)948-29-7683 E-mail: furnkawa@scorpio.cse.kyutech.ac.jp
　 Abstract:
　         Organopolysilanes are chain-like polymers, which consist of silicon backbone and organic substituents. Among the kinds of polysilanes, poly(di-methyl silane) has the most fundamental structure, and is now commercially available.

      In this paper, poly(di-methyl silane) thin films are fabricated by the vacuum evaporation method.  The orientation of the silicon backbone can be controlled by changing deposition rate as well as substrate temperature during the evaporation. When the deposition rate is high, the direction of the silicon backbone is parallel to the substrate surface, whereas it becomes perpendicular to the substrate surface, when the deposition rate is low. Using these films, sub-micron patterns are fabricated by means of electron beam lithography. The structural change of the film by the electron beam irradiation is also discussed on the basis of the infrared absorption spectrum as well as the computer simulation based on the random walk model.

　

中国复印科学与工程学会
Reprographic Scientists and Engineers Society of China 
7 Chang-Tu Rd.Tianjin300131,China  Tel:(22)26669189 Fax: (22)26669189 
E-mail: rsesc@public.tpt.tj.cn
.