The Paper's Title of The First International Conference on Imaging Science and Hardcopy
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  Eletrophotography Process

  • Carrier Transport Characteristics of polysilanes Electrophotographic Characteristics   Takaaki DOHMARU,* Takahiro YAJIMA, Seiji AKITA, Hiro-omi UEDA, Yoshikazu NAKAYAMA, Masao NAKANO, Kunio OKA,** and Takao KAWAMURA
    College of Engineering, University of Osaka Prefecture, Sakai, Osaka 591, Japan
    * Research Institute for Advanced Science and Technology, University of Osaka Prefecture, Shinkecho, Sakai, Osaka 593, Japan
    **Department of Chemistry, University of Wisconsin, Madison Wisconsin 53706, U.S.A
  • Synthesis and Application of p-Diethylaminobenzoaldehyde-β-naphthylphenylhydrazone   Xianggao Li,   Tianjin institute of Reprographic Technology, Tianjin, China
  • Novel relation between thermodynamical and transport Properties in glassy Photoconductors   Hiroyoshi Naito and Masahiro Okuda   Department of Electronics, University of Osaka Prefecture, Mozu-Umemachi, Sakai, Osaka 591, Japan

  • The Deposition Mode and Properties of a-Si:H Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition   Mei ZHANG, Yoshikazu NAKAYAMA, Kohji HITSUISHI, Hiroshi IMAMURA and Takao KAWAMURA   Electrical Engineering, College of Engineering, University of Osaka Prefecture, Mozu-Umemachi, Sakai, Osaka 591, Japan

  • Mechanism Research on Print Cycle-up of Se Alloy Photoreceptors   PH. D. XU ZHANGLONG   Engineering Department, Xerox of Shanghai Ltd. 46 Nangu Road, Minhang, Shanghai 200240, P.R. China

  • Tunnelling Assisted Photocurrent Multiplication in Amorphous Silicon Carbide Cells (Invited)   Yoshikazu NAKAYAMA, Takahiro YAJIMA, Hiro-omi UEDA, Seiji AKITA, and Takao KAWAMURA   Electrical Engineering, College of Engineering, University of Osaka Prefecture, Mozu-Umemachi, Sakai, Osaka 591, Japan

  • OPTO- Electronic Properties of a-Si:H Films by p-CVD Method with SiH-He   Youichi NAKAMURA, Satoshi SUNAGO, Yasushi SAKAI, Xiang-Feng JIN China,  Noboru KUTSUWADA Nippon Institute of Technology, Miyashiro, Minami-Saitama, Saitama 345 Japan, Toshimichi OKAMOTO, Kenji BOUNO  Chichibu Fuji Co., Ltd. Ogano, Chichibu Saitama 368-01 Japan

  • Photoelectrical Properties of Doped a-Si:H for Electrophotographic Application   Zhaoping Wu Gangcheng Zhang Yunhua Shen Yongling Wang   Department of Amorphous Materials, Shanghai Institute of Ceramics, Chinese Academy of Science, Shanghai 200050, China

  • Structural Study of a-Si1-xCx:H Films Produced by Plasma- CVD   Kazuki WAKITA, Hideki HAYASHI, Yoshikazu NAKAYAMA, and Takao KAWAMURA   Electrical Engineering, College of Engineering, University of Osaka Prefecture, Mozu-Umemachi, Sakai, Osaka 591, Japan

  • A study on Doped a-Si:H for Electrophotographic Photoreceptors   Cao Lihui Zhang Gangcheng Zhong Baiqiang   Shanghai Institute of Ceramics, Chinese Academy of Sciences

  • Novel Color Electrophotography using Superimposing Development   H.Yamamoto, Y. Takashima, H. Terada, H. Kunishige and T. Saitoh   Matsushita Electric Industrial Co., Ltd. Kadoma 570, Osaka Japan

  • Effect of Roughness on Copying Properties and Evaluating Methods (Invited)   Zhang Jingyan, Hou Weiling   Paper Research Institute of Tianjin 4 Dongjian Str, Tianwei Road Tianjin, 300141, China

  • Plasma Spraying Technique in Magnetography   Shoji MURAKAMI, Noboru KUTSUWADA, Tamotsu TAMAKI  Nippon Institute of Technology, Miyashiro-cho, Saitama 345 Japan,   Xiang-Feng JIN   Institute of Chemistry, Chinese Academy of Sciences, Beijing 100080 China

  • Electronic Publishing by Xerography (Invited)   R.W.Gundiach   Xerox Corporation, EXITE Lab. 317 Main Street East Rochester, NY 14445

  • Analysis of Scorotron Charging by Applying AC and DC Electrical Flelds  Ji-Bin Horng, Der-Ray Huang and Yu-Hsiu Chang   OPTO- Electronics & Systems Laboratory, ITRI Chutung, Hsinchu 31015, Taiwan China

  • An Overview of Tri-Level Xerography   W.E.Haas, J.E.May, D.G.Parker and H.M.Stark   Webster Research Center Xerox Corporation, 800 Phillips Road, Webster NY 14580 USA

  • Trickle-Continuous Developer Material Replenishment   Steven C.Hart, Jeffrey J. Folkins, and Cyril G.Edmunds   
    Xerox Corporation, 800 Phillips Road, Webster NY 14580

  • Friction Analysis on a Pair of Rollers   Yu-Gang Chen and Shu-Cheng Hsieh   OPTO- Electronics & Systems Laboratory, ITRI Chutung, Hsinchu 31015, Taiwan

  • Optimization Techniques in Lens Design   XIANGXI CHEN WEITAO ZHU WANXIANG LI   Shanghai Institute of Mechanical Engineering, 516 Jun Gong Rd., Shanghai, 200093 China

  • Overview of Two Component Electrophotographic Development Physics (Invited)   Kelly Robinson, Arthur Kroll and Joseph Szostek   Eastman Kodak Company Rochester, New York

  • The Application and Development of Duplicate Science in the Aspect of ZnO- Paper Base Electrostatic Plate Making and Light Print System for Large Width Folio in China   Jia Baozhong and Ma Xingrong   PO Box 16, Xi’an Shanxi, China Post Code:710077

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May 5-8, 1992
Shanghai, China

　

　
　

　
　
　

　

中国复印科学与工程学会
Reprographic Scientists and Engineers Society of China 
7 Chang-Tu Rd.Tianjin300131,China  Tel:(22)26669189 Fax: (22)26669189 
E-mail: rsesc@public.tpt.tj.cn
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